3. Etching technique: remove material layer selectively 4. Epitaxial growth – growth the same (or close to) the crystal structure on the substrate’s surface 5. Oxidation, doping 6. Chemical mechanical planarization Chap5. Analysis and checking of micro and nano fine structure (6 class hours) The main methods are: Optical methods, electron and ion microscopy analysis methods, acoustic methods, scanning probe microscopy methods. Chap6. Use of micro and nano fine structure (4 class hours) The main fields are: 1. Microelectronics technology and integrated circuit systems 2. Integrated optics 3. MEMS and MOMES 4. Vacuum microelectronic technology 5. Mesoscopic and new principle quantum effect devices 6. Microprobe and micro-sensor NO9. Assignments and examinations Normal Performance 15%+ Examination result 85% Reference Books： 1. Fabrication Engineering at the Micro- and Nanoscale (Third Edition). Stephen A. Campbell, Beijing, Electronic Industry Press 2. Nanofabrication scientific principles, Tang tiantong. Beijing, Electronic Industry Press 3. Micro-nano sensor and its application, Zhu yong, Beijing, Peking University Press 4. Introduction to Microfabrication. Sami Franssila., Beijng, Electronic Industry Press
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