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This work was partially supported by the Core Research for Evolutional Science and
Technology of the Japan Science and Technology Agency. The authors thank Dr. H. Kanai at Materials Analysis Station of NIMS, Japan for high resolution SEM image measurement, and Mr. T. Shimizu, Mr. T. Ishikawa for technical support. The author, L. Han, thanks for Prof. Hiroyoshi Naito of Osaka Prefecture University and Dr. Masafumi Shimizu of Institute of Advanced Energy, Kyoto University for their useful discussions. The author, M. Gr?tzel thanks for financial support of this work under the Swiss Nanotera and Swiss National Science Foundation PV2050 program and acknowledges his affiliation as a visiting
faculty member with Nanyang Technological University (NTU) Singapore and the Advanced Institute for Nanotechnology at Sungkyunkwan University (SKKU), Suwon, Korea. SUPPLEMENTARY MATERIALS
www.sciencemag.org/cgi/content/full/science.aad1015/DC1 Materials and Methods Figs. S1 to S15 Tables S1 to S3 References (48–50)
27 July 2015; accepted 14 October 2015 Published online 29 October 2015 10.1126/science.aad1015
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Fig. 1. Structure and band alignments of the PSC. (A) Scheme of the cell configuration highlighting the doped charge carrier extraction layers. The right
insets shows the composition of Ti(Nb)Ox and the crystal structure of lithium doped NixMg1–xO, denoted as NiMg(Li)O. (B) A high resolution cross–sectional SEM image of a complete solar cell (the
corresponding EDX analysis results are shown in fig. S5 (14),
demonstrating the presence of the p+–doped NixMg1–xO and n+–doped TiOx charge extraction layers). (C) Band alignments of the solar cell. The data of MAPbI3 and PCBM are taken from (11).
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Fig. 2. Dopant enhanced conductivity of NiO and TiOx. (A) Comparison of the conductivity mapping results for NiO (Left) and Li0.05Mg0.15Ni0.8O (Right) films. (B) Left: Comparison of the I–V curves of NiO and Li0.05Mg0.15Ni0.8O films deposited on FTO glass and Right: Comparison of the I–V curves for TiOx and Ti0.95Nb0.05Ox films deposited on PCBM/ITO glass, obtained by SPM measurements. Thickness was 20 nm for both NiO and TiOx based films.
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